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| Título: |
SELECTIVE AREA EPITAXIAL GROWTH OF III-V SEMICONDUCTOR STRUCTURES FOR OPTOELECTRONIC APPLICATIONS |
| Instituição: |
PONTIFÍCIA UNIVERSIDADE CATÓLICA DO RIO DE JANEIRO - PUC-RIO |
| Autor(es): |
FRANCISCO JUAN RACEDO NIEBLES
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| Colaborador(es): |
PATRICIA LUSTOZA DE SOUZA - Orientador
MAURICIO PAMPLONA PIRES - Coorientador
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| Catalogação: |
07/12/2005 |
| Tipo: |
THESIS
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Idioma(s): |
PORTUGUESE - BRAZIL
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| Referência [pt]: |
http://www.maxwell.lambda.ele.puc-rio.br/Busca_etds.php?strSecao=resultado&nrSeq=7569@1 |
| Referência [en]: |
http://www.maxwell.lambda.ele.puc-rio.br/Busca_etds.php?strSecao=resultado&nrSeq=7569@2 |
| Resumo: |
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The monolithic integration of a modulator with a waveguide
is a lot of interest for application in optical
communications for the fact in that can decrease the
losses for optical joining between the two devices and to
use short modulators that operate in high rates of
transmission data. The selective growth is at the present
time, one the more promising technique for application in
the monolithic integration of semiconductors device. This
technique allows to control the thickness and the stress
of the grown layers allowing to improve the integration
and the characteristics of the devices structures.
These thesis is about the implementation, study
and application of the selectuve growth by MOCVD of both
match and tensile structures of multi quantum wells of
inGaAs/InAlAs for the production of the amplitude
modulators based on the Stark effect and its integration
with waveguide. The performance of the modulators based on
structures of multi quantum wells of InGaAs/InAlAs
operating in 1,55 um, is notably improved whena Ga
composition of 52% is used and the thickness of a quantum
well is near to ~100 A. In that case, the modulators have
a high figured of merit and they can be insensitive to the
polarization.
In this study, several samples was grown and the
growing rate increase was analyzed and the variation of
the composition in InGaAs and InAlAs in bulk alloys and in
quantum wells of InGaAs/InAlAs in function of the window
where the growth is spent. Finally, waveguides were
processed whose structures were grown with the technique
of selective growth. Those guides were characterized by
the near field technique.
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